SUEMASU Takashi

Researcher's full information

Articles
  • Investigation of direct and indirect bandgaps of [100]-oriented nearly strain-free β-FeSi2 films groun by molecular beam epitaxy
    末益 崇
    Appl. Phys. Lett./(Vol. 80)/p.No. 4, 556-558, 2002-01
  • Structure Analysis of FeSi_2 Embeded in Si by Transmission Electron Microscopy
    知京 豊裕; 成毛 環美; アヘメト パールハット; 朱 敏; 末益 崇; 長谷川 文夫
    まてりあ : 日本金属学会会報/40(12)/p.1013, 2001-12
  • Direct Growth of [100]-Oriented High-Quality β-FeSi_2 Films on Si(001) Substrates by Molecular Beam Epitaxy(Semiconductors)
    HIROI Noriyoshi; SUEMASU Takashi; TAKAKURA Ken'ichiro; SE...
    Japanese journal of applied physics. Pt. 2, Letters/40(10)/pp.L1008-L1011, 2001-10
  • Donor and Acceptor Levels in Undoped β-FeSi_2 Films Grown on Si (001) Substrates : Semiconductors
    TAKAKURA Ken-ichiro; SUEMASU Takashi; HASEGAWA Fumio
    Japanese journal of applied physics. Pt. 2, Letters/40(3)/pp.L249-L251, 2001-03
  • Donor and Acceptor Levels of Undoped β-FeSi2 Films Grown on Si(001)Substrates
    末益 崇
    Japanese Journal of Applied Physics/40(3B)/p.L249-L251, 2001-01
  • Optical absorption spectra of β-FeSi2 under pressure
    末益 崇
    Physical and Status Solidi(b)/223/p.259-263, 2001-01
  • Influence of Si growth temperature for embedding β-FeSi2 and resultant strain in β-FeSi2 on light emission from p-Si/β-FeSi2 particles/n-Si light-emitting diodes
    末益 崇
    Appl. Phys. Lett./(Vol. 79)/p.No. 12, 1804-1806, 2001-01
  • 鉄シリサイドβ-FeSi2を活性領域とするSi系LEDの室温発光-Si ICの光配線用光源を目指して
    末益 崇
    真空ジャーナル/75(3)/p.5-9, 2001-01
  • Dependence of photoluminescence from β-FeSi2 and induced deep levels in Si on the size of embedded β-FeSi2 balls in Si
    末益 崇
    Thin Solid Films/381/p.209-213, 2001-01
  • Direct Growth of [100]-Oriented β-FeSi2 Films on Si(001) Sustrates by Molecular Beam Epitaxy
    末益 崇
    Jpn. J. Appl. Phys./(Vol. 40)/p.No. 10A, L1008-L1011, 2001-01
  • Control of the Conduction Type of Nondoped High Mobility β-FeSi_2 Films Grown from Si/Fe Multilayers by Change of Si/Fe Ratios
    TAKAKURA Ken-ichiro; SUEMASU Takashi; IKURA Yoshihiro; HA...
    Japanese journal of applied physics. Pt. 2, Letters/39(8)/pp.L789-L791, 2000-08
  • Current status future prospects of β-FeSi_2 research:An environmentally friendly and direct-band-gap semiconductor
    末益 崇; 長谷川 文夫
    應用物理/69(7)/pp.804-810, 2000-07
  • One Possibility of Obtaining Bulk GaN: Halide VPE Growth at 1000℃ on GaAs (111) Substrates(Special Issue on Blue Laser Diodes and Related Devices/Technologies)
    HASEGAWA Fumio; MINAMI Masato; SUEMASU Takashi
    IEICE transactions on electronics/83(4)/pp.633-638, 2000-04
  • Improvement of the Electrical Properties of β-FeSi_2 Films on Si(001)by High-Temperature Annealing
    TAKAKURA Ken-ichiro; SUEMASU Takashi; HIROI Noriyoshi; HA...
    Japanese journal of applied physics. Pt. 2, Letters/39(3)/pp.L233-L236, 2000-03
  • Fabrication of β-FeSi_2 Spheres embeddes in Si by Molecular Beam Epitaxy and Enhancement of the Infrared Photoluminescence by High Temperature Annealing
    末益 崇; 飯倉 祐介; 高倉 健一郎; 長谷川 文夫
    The Review of laser engineering/28(2)/pp.99-102, 2000-02
  • CBE Growth of GaN on GaAs(001) and (111)B Substrates Using Monomethylhydrazine
    末益 崇
    Journal of Crystal Growth/209(2-3)/p.373-377, 2000-01
  • 熱反応堆積法を利用した赤外発光β-FeSi2球及び高移動度β-FeSi2膜の作製:高温アニールによる特性改善 (〈特集〉環境半導体)
    末益 崇; 高倉 健一郎; 飯倉 祐介
    Journal of the Materials Science Society of Japan/37(1)/pp.16-20, 2000-01
  • One Possibility of Obtaining Bulk GaN : halide VPE Growth at 1000℃ on GaAs(111) Substrates
    末益 崇
    IEICE Trans. Electron./83-C(4)/p.633-638, 2000-01
  • Optimum annealing condition for 1.5μm photoluminescence from reactive deposition epitaxy β-FeSi2 balls embedded in Si crystals
    末益 崇
    Journal of Luminescence/87-89/p.528-531, 2000-01
  • Room Temperature 1.6μm Electroluminescence from a Si-Based Light-Emitling Diode with β-FeSi2 Active Region
    末益 崇
    Japanese Journal of Applied Physics/39(10B)/p.L1013-L1015, 2000-01
  • 熱反応堆積法を利用した赤外発光β-FeSi2球及び高移動度β-FeSi2 膜の作製:高温アニールによる特性改善
    末益 崇
    材料科学/37(1)/p.16-20, 2000-01
  • 環境にやさしい直接遷移型半導体β-FeSi2の研究の現状と将来展望
    末益 崇
    応用物理/39(7)/p.804-816, 2000-01
  • Control of the conduction Type of Nondoped High Mobility β-FeSi2 Films Grown from Si/Fe Multilayers by Change of Si/Fe Ratios
    末益 崇
    Japanese Journal of Applied Physics/39(8A)/p.L789-L781, 2000-01
  • Growth of Mn-Doped β-FeSi2 Films on Si(001) by Reactive Deposition Epitaxy
    末益 崇
    Thin Solid Films/369(1-2)/p.253-256, 2000-01
  • Growth of Continuous and Highly (100)-Oriented β-FeSi_2 Films on Si(001) from Si/Fe Multilayers with SiO_2 Capping and Templates
    Suemasu Takashi; Hiroi Noriyoshi; Fujii Tetsuo; Takakura ...
    Japanese journal of applied physics. Pt. 2, Letters/38(8)/pp.L878-L881, 1999-08
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