MURAKAMI Kouichi
- Articles
- Chemical Reaction of Si Nanoparticles during Formation in Gas Phase observed by a Time-Resolved Photoluminescence Method
T. Mizuta; D. Takeuchi; T. Makimura; K. Murakami
Jpn.J.Appl.Phys./41/p.5739-5744, 2002 - Hyperfine Structure of Electron Spin Resonance of Phosphorus Doped Si Nanocrystals
M. Fujii; A; Mimura; S. Hayashi; Y. Yamamoto; and K. Murak...
Phys. Rev. Letters/89/p.206805-1 - 4, 2002 - Increase of 1.5μm Luminescence from Cryogenic Temperature to Room Temperature from Er-doped SiO2 Films with Si Nanocrystallites by laser Ablation
Changquing Li; K. Kondo; T. Makimura; and K. Murakami; +村...
Jpn. J. Appl. Phys./42/p.3424-3428, 2003 - Hydrogen-terminated Defects in Ion-Implanted Silicon probed by Monoenergetic Positron Beams
A.Uedono; T. Mori; K. Morisawa; K. Murakami; T. Ohdaira; R...
J. Appl. Phys./93/p.3228-3233, 2003 - Formation Mechanism of Interstitial Hydrogen Molecules in Crystalline Silicon
K. Ishioka; N. Umehara; S. Fukuda; T. Mori; S. Hishita; I...
Jpn,. J. Appl. Phys./42/p.5410-5414, 2003 - In situ Spectroscopic Measurement of Transmitted Light related to Defect Formation in SiO2 during Femtosecond Laser Irradiation
N. Fukata; Y. Yamamoto; K. Murakami; M. Hase; and M. Kit...
Appl. Phys. Letters/83/p.3495-3497, 2003 - Optical Excitation of Er Ions with 1.5 m Luminescence via the Luminescent State in Si Nanocrystallites embedded in SiO2 Matrices
T. Makimura; K. Knodo; H. Uematsu; C. Li; K. Murakami
Appl. Phys. Letters 83/83/p.5422-5424, 2003 - 講座：レーザーアブレーションの物理と応用 ２．レーザー光と固体との相互作用
村上 浩一
J. Plasma Fusion Res./79/p.1035-1042, 2003 - レーザーアブレーションによる可視発光Siナノ微粒子の生成ダイナミックスと表面修飾
水田泰治; 牧村哲也; 村上浩一
レーザ加工学会誌 （Journal of Japan Laser Processing Society）/10/p.45-52, 2003 - In-situ Size measurement of Si Nanoparticles and Formation Dynamics after Laser Ablation
村上 浩一
Appl. Phys. A/79/p.819-822, 2004 - Excitation of Er Atoms by Energy Transfer from Si Nanocrystallites embedded in SiO2 Matrices Fabricated by Laser Ablation
村上 浩一
Appl. Phys. A/79/p.799-802, 2004 - In-situ Spectroscopic Measurement of Structural Change in SiO2 during Femtosecond Laser Irradiation (invited talk)
村上 浩一
Appl. Phys A/79/p.1425-1428, 2004 - Micromachining of inorganic transparent materials using pulsed laser plasma soft X-rays at 10 nm
Tetsuya Makimura; Youichi Kenmotsu; Hisao Miyamoto; Sa...
Proc. SPIE/5713/p.9-20, 2005 - Direct micromaching of quartz glass plates using puslsed laser plasma soft X-rays
T. Makimura; H. Miyamoto; Y. Kenmotsu; K. Murakami; and ...
Appl. Phys. Letters/86/p.103111(1-4), 2005 - レーザーとナノ物性 －レーザーアブレーションで創製したＳｉナノ構造の物性－
村上浩一; 牧村哲也; 深田直樹
レーザー研究/33/p.5-11, 2005 - Direct Micromachining of Inorganic Transparent Materials Using Laser Plasma Soft X-Rays
Tetsuya Makimura; Hisao Miyamoto; Satoshi Uchida; Hiroyuk...
Proc. The 8th International Conference on X-ray Microscopy, 2006 - Enhancement of photoluminescence of Er and Si nanocrystallites in Er-doped SiO2 by hydrogen passivation
N. Fukata; C. Li; H. Morihiro; K. Murakami; M. Mitome; an...
Appl. Phys. A/84/p.395-401, 2006 - Silica Nanomachining Using Laser Plasma Soft X-Rays
Tetsuya Makimura; Satoshi Uchida; Kouichi Murakami; and ...
Appl. Phys. Letters/89/p.101118(1-3), 2006 - Direct Nanomachining of Inorganic Transparent Materials Using Laser Plasma Soft X-Rays
Tetsuya Makimura; Hisao Miyamoto; Satoshi Uchida; Hiroyuk...
Journal of Physics, 2006 - Ablation of Inorganic materials using Laser Plasma Soft X-rays
T. Makimura; T. Fujimori; S. Uchida; and K. Murakami; +村上...
Proc.SPIE/6586/p.658609, 2007 - Synthesis of Silicon Nanocrystals in Aluminum Doped SiO2 Film by Laser Ablation Method
N. Uchida; T. Okami; H. Tagami; N. Fukata; and K. Muraka...
Physica E, 2007 - Phonon confinement and impurity doping in silicon nanowires synthesized by laser ablation
N. Fukata; T. Oshima; N. Okada; S. Matsushita; T. Tsurui...
Solid State Phenom./131-133/p.553-558, 2008 - Phosphorus Ion Implantation in Silicon Nanocrystals embedded in SiO2
Kouichi Murakami; Ryota Shirakawa; Masatoshi Tsujimura; N...
J. Appl. Phys./105/p.054307 1-5, 2009 - In situ spectroscopic measurement of defect formation in SiO2 induced by femtosecond laser irradiation
N. Fukata; Y. Yamamoto; K. Murakami; M. Hase; M. Kitajima
Physica B/340-342/pp.986-989, 2003-12 - Development of a micromachining system for irradiation with narrow band soft X-ray at high power density and micromachining of silicone rubber
鳥居 周一; 牧村 哲也; 村上 浩一; 岡崎 功太; 中村 大輔; 岡田 龍雄; 高橋 昭彦; 新納 弘之
電気学会研究会資料. OQD, 光・量子デバイス研究会/2012(1)/pp.5-8, 2012-03 - more...
- Chemical Reaction of Si Nanoparticles during Formation in Gas Phase observed by a Time-Resolved Photoluminescence Method