Nonaka Hidehiko

Affiliation

University of Tsukuba

Official title

Professor

ORCID

Career history


1986-04 -- 2020-03	産業技術総合研究所分析計測研究部門（最終）研究部門長（最終）

Academic background


1984-04 -- 1986-03	東京大学理学系研究科化学専門課程（修士）
1980-04 -- 1984-03	東京大学理学部化学

Degree


1995-02	工学博士	東京大学

Academic societies


1986-09 -- (current)	応用物理学会
1984-04 -- (current)	日本化学会
1993-01 -- (current)	日本真空学会（2018より日本表面真空学会となる）

Articles

Defects and their control in SiO2 films prepared by D2-lamp photo-CVD
Nonaka Hidehiko; Arai Kazuo; Ichimura Shingo
Materials Research Society Symposium Proceedings/131/pp.507-512, 1989-01
Laser-ablated particles from porous silicon
Nonaka Hidehiko; Sekine Shigeyuki
Materials Research Society Symposium Proceedings/354/pp.591-596, 1995-12
Surface oxidation of Si(111) by high purity ozone and negative ions produced by Rydberg electron transfer
Nonaka Hidehiko; Kurokawa Akira; Nakamura Ken; Ichimura ...
Materials Research Society Symposium Proceedings/446/pp.53-38, 1997-07
Ozone cleaning of carbon-related contaminants on Si wafers and other substrate materials
Nonaka Hidehiko; Kurokawa Akira; Ichimura Shingo; Moon D...
Materials Research Society Symposium Proceedings/477/pp.493-498, 1997-10
Development of high purity one atm. ozone source-its application to ultra thin SiO2 film formation on Si substrate
Koike Kunihiko; Inoue Goichi; Ichimura Shingo; Nakamura ...
Materials Research Society Symposium Proceedings/567/pp.121-126, 1999-11
Laser Ablation of Solid Ozone
Nonaka Hidehiko; Nishiguchi Tetsuya; Morikawa Yoshiki; Mi...
Materials Research Society Symposium Proceedings/617/pp.J3.1-J3.6, 2001-02
Final report on VAMAS round-robin study to evaluate a correction method for saturation effects in DSIMS
Takano Akio; Nonaka Hidehiko; Homma Yoshikazu; Tomita Mi...
Surface and Interface Analysis/47(6)/pp.681-700, 2015-04
VAMAS round-robin study to evaluate a correction method for saturation effects in D-SIMS
Takano Akio; Nonaka Hidehiko; Homma Yoshikazu; Tomita Mi...
Surface and Interface Analysis/46(S1)/pp.244-248, 2014-11
Emission characteristics of a charged-droplet beam source using vacuum electrospray of an ionic liquid
Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Ichimura ...
Surface and Interface Analysis/45(1)/pp.517-521, 2013-01
Stabilities and dissociation reactions of the Irm(CO)n+ ions observed in TOF-SIMS of Ir4(CO)12 thin layer
Nakanaga Taisuke; Nagai Hidekazu; Saito Naoaki; Fujiwara ...
Chemical Physics Letters/556/pp.44-48, 2013-01
Comparison of a new dead-time correction method and conventional models for SIMS analysis
Takano Akio; Yakenaka Hisataka; Ichimaru Satoshi; Nonaka ...
Surface and Interface Analysis/44(9)/pp.1287-1293, 2012-09
Beam characteristics of positively and negatively charged droplets generated by vacuum electrospray of an ionic liquid
Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Ichimura ...
Japanese Journal of Applied Physics/51(3)/pp.36701-1-36701-8, 2012-03
Component analysis of a mixed beam generated by vacuum electrospray of an ionic liquid
Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Ichimura ...
Journal of Applied Physics/111(6)/pp.64901-1-64901-7, 2012-03
Mass shift in the mass spectra of TOF-SIMS and the analysis of kinetic energies of the ions
Nakanaga Taisuke; Nagai Hidekazu; Saito Naoaki; Fujiwara ...
International Journal of Mass Spectrometry/311/pp.24-30, 2011-02
Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) using the metal- cluster-complex primary ion of Ir4(CO)7+
Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Suzuki At...
Surface and Interface Analysis/43(1/2)/pp.245-248, 2011-02
Plasma Diagnostics for NH3 Plasmas Using a Quartz Sensor at Various Pressures
Suzuki Atsushi; Nonaka Hidehiko
Japanese Journal of Applied Physics/50(1)/pp. 01AA03-1- 01AA03-7, 2011-01
Characteristics of a charged-droplet beam generated by vacuum electrospray of an ionic liquid
Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Nakanaga ...
Chemical Physics Letters/501/pp.335-339, 2011-01
Mass Markers for Time-of-Flight Secondary Ion Mass Spectrometry Spectrum in a Large Mass Region Using Ir4(CO)12 Metal Cluster Complex Sample
Nonaka Hidehiko; Nakanaga Taisuke; Fujiwara Yukio; Saito ...
Japanese Journal of Applied Physics/49(8)/pp.086601-1-086601-6, 2010-08
Measurement for dissociation ratio of source gases in plasmas using a quartz sensor
Suzuki Atsushi; Nonaka Hidehiko
Vacuum/84(12)/pp.1389-1392, 2010-06
A new cluster-ion-beam source for Secondary Ion Mass Spectrometry (SIMS) using the electrospray of a pure ionic liquid under high vacuum
Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Nakanaga ...
Nuclear Instruments and Methods in Physics Research Section B/268/pp.1938-1941, 2010-05
Evaluation of outermost surface temperature of silicon substrates during UV-excited ozone oxidation at low temperature
Kameda Naoto; Nishiguchi Tetsuya; Morikawa Yoshiki; Kekur...
Analytical Science/26(2)/pp.273-276, 2010-02
Metal-cluster-complex primary ion beam source for Secondary Ion Mass Spectrometry (SIMS)
Fujiwara Yukio; Watanabe Kouoji; Saito Naoaki; Nonaka Hi...
Vacuum/84(5)/pp.544-549, 2009-12
Ion beam generation from an electrolyte solution containing polyatomic cations and anions for Secondary Ion Mass Spectrometry (SIMS)
Fujiwara Yukio; Watanabe Kouoji; Saito Naoaki; Nonaka Hi...
Japanese Journal of Applied Physics/48(12)/pp.126005-1-126005-10, 2009-12
Improvement of Chemical Vapor Deposited-SiO2 film Properties by Annealing with UV-light-excited Ozone
Nishiguchi Tetsuya; Saitoh Shigeru; Kameda Naoto; Kekura ...
Japanese Journal of Applied Physics/48(11)/pp.116509-1-116509-5, 2009-11
Spatial distributions of gas composition in rf glow discharge plasmas measured using a quartz sensor
Suzuki Atsushi; Nonaka Hidehiko
Vacuum/84(5)/pp.554-558, 2009-10
more...

Conference, etc.

高純度オゾンを用いたALD によるAl2O3 膜段差被覆性
萩原崇之; 元田総一; 亀田直人; 中村健; 野中秀彦
第70回応用物理学会春季学術講演会/2023-03-15--2023-03-18
高純度オゾンを用いたALD によるAl2O3 膜の膜応力
萩原崇之; 元田総一; 亀田直人; 中村健; 野中秀彦
第83回応用物理学会秋季学術講演会/2022-09-20--2022-09-23
Properties of low-temperature ALD Al2O3 film by high purity ozone
萩原　崇之; 阿部　綾香; 亀田　直人; 中村　健; 野中秀彦
第81回応用物理学会秋季学術講演会/2020-09-08--2020-09-11
Room temperature ALD using high-purity ozone gas
Kameda Naoto; Hagiwara Takayuki; Abe Ayaka; Miura Toshin...
20th International Conference on Atomic Layer Deposition (ALD 2020) / 7th International Atomic Layer Etching Workshop (ALE 2020)/2020-06-29--2020-07-01

Professional activities


2021-10 -- (current)	The Japan Society of Vacuum and Surface Science	教育・育成委員会
2021-03 -- (current)	筑波会議委員会	筑波会議企画委員会/委員
2020-11 -- (current)	筑波会議委員会	筑波会議実行委員会/委員長
2007-11 -- (current)	表面化学分析技術国際標準化委員会	表面化学分析技術国際標準化委員会/委員
2007-11 -- (current)	日本計量振興協会	ISO/TC12国内委員会/委員
2015-01 -- (current)	ISO	Technical Committee 201 (Surface Chemical Analysis)/Chair

(Last updated: 2023-06-05)