UMEDA Takahide

Researcher's full information

Articles
  • Microscopic difference between dry and wet oxidations of C-face 4H-SiC MOSFFETs studied by electrically detected magnetic resonance
    Y. Kagoyama; M. Okamoto; S. Harada; R. Arai; Umeda Takahide
    Materials Science Forum/858/pp.619-622, 2016-05
  • Electrically detected magnetic resonance study on interface defects responsible for threshold-voltage shift in C-face 4H-SiC MOSFETs
    G. W. Kim; R. Arai; S. J. Ma; M. Okamoto; H. Yoshioka; S. Hara...
    Materials Science Forum/858/pp.591-594, 2016-05
  • A silicon carbide room-temperature single-photon source
    S. Castelletto; B. C. Johnson; V. Ivády; N. Stavrias; Umeda T...
    NATURE MATERIALS/13(2)/pp.151-156, 2014-02
  • Microscopic origins of dry-etching damages in silicon large-scaled integrated circuits revealed by electrically detected magnetic resonance
    K. Uejima; T. Umeda
    APPLIED PHYSICS LETTERS/104(8)/p.082111, 2014-02
  • Electrically Detected Magnetic Resonance (EDMR) Studies of SiC-SiO2 Interfaces
    T. Umeda; R. Kosugi; K. Fukuda; N. Morishita; T. Oshima; ...
    Materials Science Forum/717-720/p.427-432, 2012
  • Polymorphism of carbon forms: Polyhedral morphology and electronic structures
    M. Fujita; T. Umeda; M. Yoshida
    Physical Review B/51(19)/p.13778-13780, 1995-05
  • Electronic structure of band-tail electrons in a-Si:H
    T. Umeda; S. Yamasaki; A. Matsuda; J. Isoya; K. Tanaka
    Physical Review Letters/77(22)/p.4600-4603, 1996-11
  • Spatial distribution of phosphorus atoms surrounding spin centers of P-doped hydrogenated amorphous silicon elucidated by pulsed ESR
    S. Yamasaki; J.-K. Lee; T. Umeda; J. Isoya; K. Tanaka
    Journal of Non-crystalline Solids/198-200/p.330-333, 1996-01
  • Insitu electron-spin- resonance measurements of film growth of hydrogenated amorphous silicon
    S. Yamasaki; T. Umeda; J. Isoya; K. Tanaka
    Applied Physics Letters/70(9)/p.1137-1139, 1997-03
  • Control of crystallinity of microcrystalline silicon film grown on insulating glass substrates
    J.-H. Zhou; K. Ikuda; T. Yasuda; T. Umeda; S. Yamasaki; K...
    Journal of Non-crystalline Solids/227-230/p.857-860, 1998-01
  • Energy location of light-induced ESR centers in undoped a-Si:H
    T. Umeda; S. Yamasaki; A. Matsuda; J. Isoya; K. Tanaka
    Journal of Non-crystalline Solids/227-230/p.353-357, 1998-01
  • Microscopic nature of localized states in a-Si:H and their role in metastability
    S. Yamasaki; T. Umeda; J. Isoya; J.H. Zhou; K. Tanaka
    Journal of Non-crystalline Solids/227-230/p.332-337, 1998-01
  • Existence of surface region with high dangling bond density during a-Si:H film growth
    S. Yamasaki; T. Umeda; J. Isoya; K. Tanaka
    Journal of Non-crystalline Solids/227-230/p.83-87, 1998-01
  • Electron spin resonance center of Dangling bonds in undoped a-Si:H
    T. Umeda; S. Yamasaki; J. Isoya; K. Tanaka
    Physical Review B/59(7)/p.4849-4857, 1999-02
  • Microscopic origin of light-induced ESR centers in undoped a-Si:H
    T. Umeda; S. Yamasaki; J. Isoya; K. Tanaka
    Physical Review B/62(23)/p.15702-15710, 2000-12
  • In situ electron spin resonance of initial oxidation processes of Si surfaces
    T. Umeda; S. Yamasaki; M. Nishizawa; T. Yasuda; K. Tanaka
    Applied Surface Science/162-163/p.299-302, 2000-01
  • Defects related to DRAM leakage current studied by electrically detected magnetic resonance
    T. Umeda; Y. Mochizuki; K. Okonogi; K. Hamada
    Physica B/308-310/p.1169-1172, 2001-01
  • Charge-trapping defects cat-CVD silicon nitride films
    T. Umeda; Y. Mochizuki; Y. Miyoshi; Y. Nashimoto
    Thin Solid Films/395/p.266-269, 2001-01
  • Electron spin resonance observation of the Si(111)-(7×7) surface and its oxidation process
    T. Umeda; M. Nishizawa; T. Yasuda; J. Isoya; S. Yamasaki...
    Physical Review Letters/86(6)/p.1054-1057, 2001-01
  • In situ ESR observation of interface dangling bond formation processes during amorphous SiO_2_ growth on Si
    W. Futako; T. Umeda; M. Nishizawa; T. Yasuda; J. Isoya; S...
    Journal of Non-crystalline Solids/299-302/p.575, 2002-01
  • Ellectrically detected magnetic resonance of ion-implantation damage centers in silicon large-scale integrated circuits
    T. Umeda; Y. Mochizuki; K. Okonogi; K. Hamada
    Journal of Applied Physics/94(11)/p.7105-7111, 2003-12
  • EPR and pulsed ENDOR study of EI6 and related defects in 4H-SiC
    T. Umeda; Y. Ishitsuka; J. Isoya; N. Morishita; T. Ohshima; T....
    Materials Science Forum/457-460(465)/pp.465-468, 2004-01
  • Improvement of Data Retention Time Property by Reducing Vacancy-Type Point Defect in DRAM Cell Transistor
    K. Okonogi; K. Ohyu; T. Umeda; H. Miyake; S. Fujieda
    Proceedings International Reliability Physics Symposium 2006/2005/p.695, 2005-03
  • Quantitative identification for the physical origin of variable retention time: a vacancy-oxygen complex defect model
    K. Ohyu; T. Umeda; K. Okonogi; S. Tsukada; M. Hidaka; S. ...
    Technical Digest International Electron Device Meeting (IEDM) 2006/2006/p.389, 2006-12
  • A web-based database system for EPR centers in semiconductors
    T. Umeda; S. Hagiwara; M. Katagiri; N. Mizuochi; J. Isoya
    Physica B/376-377/p.249-252, 2006-01
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