現在地

野中 秀彦(ノナカ ヒデヒコ; Nonaka, Hidehiko)

face
所属
筑波大学
職名
教授
ORCID
0000-0003-3573-4875
職歴
1986-04 -- 2020-03産業技術総合研究所 分析計測研究部門(最終) 研究部門長(最終)
学歴
1984-04 -- 1986-03東京大学 理学系研究科 化学専門課程(修士)
1980-04 -- 1984-03東京大学 理学部 化学
取得学位
1995-02工学博士東京大学
所属学協会
1986-09 -- (現在)応用物理学会
1984-04 -- (現在)日本化学会
1993-01 -- (現在)日本真空学会(2018より日本表面真空学会となる)
査読付き学術雑誌・国際会議論文
  • Defects and their control in SiO2 films prepared by D2-lamp photo-CVD
    Nonaka Hidehiko; Arai Kazuo; Ichimura Shingo
    Materials Research Society Symposium Proceedings/131/pp.507-512, 1989-01
  • Laser-ablated particles from porous silicon
    Nonaka Hidehiko; Sekine Shigeyuki
    Materials Research Society Symposium Proceedings/354/pp.591-596, 1995-12
  • Surface oxidation of Si(111) by high purity ozone and negative ions produced by Rydberg electron transfer
    Nonaka Hidehiko; Kurokawa Akira; Nakamura Ken; Ichimura S...
    Materials Research Society Symposium Proceedings/446/pp.53-38, 1997-07
  • Ozone cleaning of carbon-related contaminants on Si wafers and other substrate materials
    Nonaka Hidehiko; Kurokawa Akira; Ichimura Shingo; Moon Da...
    Materials Research Society Symposium Proceedings/477/pp.493-498, 1997-10
  • Development of high purity one atm. ozone source-its application to ultra thin SiO2 film formation on Si substrate
    Koike Kunihiko; Inoue Goichi; Ichimura Shingo; Nakamura K...
    Materials Research Society Symposium Proceedings/567/pp.121-126, 1999-11
  • Laser Ablation of Solid Ozone
    Nonaka Hidehiko; Nishiguchi Tetsuya; Morikawa Yoshiki; Mi...
    Materials Research Society Symposium Proceedings/617/pp.J3.1-J3.6, 2001-02
  • Final report on VAMAS round-robin study to evaluate a correction method for saturation effects in DSIMS
    Takano Akio; Nonaka Hidehiko; Homma Yoshikazu; Tomita Mit...
    Surface and Interface Analysis/47(6)/pp.681-700, 2015-04
  • VAMAS round-robin study to evaluate a correction method for saturation effects in D-SIMS
    Takano Akio; Nonaka Hidehiko; Homma Yoshikazu; Tomita Mit...
    Surface and Interface Analysis/46(S1)/pp.244-248, 2014-11
  • Emission characteristics of a charged-droplet beam source using vacuum electrospray of an ionic liquid
    Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Ichimura S...
    Surface and Interface Analysis/45(1)/pp.517-521, 2013-01
  • Stabilities and dissociation reactions of the Irm(CO)n+ ions observed in TOF-SIMS of Ir4(CO)12 thin layer
    Nakanaga Taisuke; Nagai Hidekazu; Saito Naoaki; Fujiwara ...
    Chemical Physics Letters/556/pp.44-48, 2013-01
  • Comparison of a new dead-time correction method and conventional models for SIMS analysis
    Takano Akio; Yakenaka Hisataka; Ichimaru Satoshi; Nonaka ...
    Surface and Interface Analysis/44(9)/pp.1287-1293, 2012-09
  • Beam characteristics of positively and negatively charged droplets generated by vacuum electrospray of an ionic liquid
    Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Ichimura S...
    Japanese Journal of Applied Physics/51(3)/pp.36701-1-36701-8, 2012-03
  • Component analysis of a mixed beam generated by vacuum electrospray of an ionic liquid
    Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Ichimura S...
    Journal of Applied Physics/111(6)/pp.64901-1-64901-7, 2012-03
  • Mass shift in the mass spectra of TOF-SIMS and the analysis of kinetic energies of the ions
    Nakanaga Taisuke; Nagai Hidekazu; Saito Naoaki; Fujiwara ...
    International Journal of Mass Spectrometry/311/pp.24-30, 2011-02
  • Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) using the metal- cluster-complex primary ion of Ir4(CO)7+
    Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Suzuki Ats...
    Surface and Interface Analysis/43(1/2)/pp.245-248, 2011-02
  • Plasma Diagnostics for NH3 Plasmas Using a Quartz Sensor at Various Pressures
    Suzuki Atsushi; Nonaka Hidehiko
    Japanese Journal of Applied Physics/50(1)/pp. 01AA03-1- 01AA03-7, 2011-01
  • Characteristics of a charged-droplet beam generated by vacuum electrospray of an ionic liquid
    Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Nakanaga T...
    Chemical Physics Letters/501/pp.335-339, 2011-01
  • Mass Markers for Time-of-Flight Secondary Ion Mass Spectrometry Spectrum in a Large Mass Region Using Ir4(CO)12 Metal Cluster Complex Sample
    Nonaka Hidehiko; Nakanaga Taisuke; Fujiwara Yukio; Saito ...
    Japanese Journal of Applied Physics/49(8)/pp.086601-1-086601-6, 2010-08
  • Measurement for dissociation ratio of source gases in plasmas using a quartz sensor
    Suzuki Atsushi; Nonaka Hidehiko
    Vacuum/84(12)/pp.1389-1392, 2010-06
  • A new cluster-ion-beam source for Secondary Ion Mass Spectrometry (SIMS) using the electrospray of a pure ionic liquid under high vacuum
    Fujiwara Yukio; Saito Naoaki; Nonaka Hidehiko; Nakanaga T...
    Nuclear Instruments and Methods in Physics Research Section B/268/pp.1938-1941, 2010-05
  • Evaluation of outermost surface temperature of silicon substrates during UV-excited ozone oxidation at low temperature
    Kameda Naoto; Nishiguchi Tetsuya; Morikawa Yoshiki; Kekur...
    Analytical Science/26(2)/pp.273-276, 2010-02
  • Metal-cluster-complex primary ion beam source for Secondary Ion Mass Spectrometry (SIMS)
    Fujiwara Yukio; Watanabe Kouoji; Saito Naoaki; Nonaka Hid...
    Vacuum/84(5)/pp.544-549, 2009-12
  • Ion beam generation from an electrolyte solution containing polyatomic cations and anions for Secondary Ion Mass Spectrometry (SIMS)
    Fujiwara Yukio; Watanabe Kouoji; Saito Naoaki; Nonaka Hid...
    Japanese Journal of Applied Physics/48(12)/pp.126005-1-126005-10, 2009-12
  • Improvement of Chemical Vapor Deposited-SiO2 film Properties by Annealing with UV-light-excited Ozone
    Nishiguchi Tetsuya; Saitoh Shigeru; Kameda Naoto; Kekura ...
    Japanese Journal of Applied Physics/48(11)/pp.116509-1-116509-5, 2009-11
  • Spatial distributions of gas composition in rf glow discharge plasmas measured using a quartz sensor
    Suzuki Atsushi; Nonaka Hidehiko
    Vacuum/84(5)/pp.554-558, 2009-10
会議発表等
  • 高純度オゾンを用いた低温ALD Al2O3膜の性質
    萩原 崇之; 阿部 綾香; 亀田 直人; 中村 健; 野中 秀彦
    第81回応用物理学会秋季学術講演会/2020-09-08--2020-09-11
  • Room temperature ALD using high-purity ozone gas
    Kameda Naoto; Hagiwara Takayuki; Abe Ayaka; Miura Toshino...
    20th International Conference on Atomic Layer Deposition (ALD 2020) / 7th International Atomic Layer Etching Workshop (ALE 2020)/2020-06-29--2020-07-01
学協会等委員
2021-03 -- (現在)筑波会議委員会筑波会議企画委員会/委員
2020-11 -- (現在)筑波会議委員会筑波会議実行委員会/委員長
2007-11 -- (現在)表面化学分析技術国際標準化委員会表面化学分析技術国際標準化委員会/委員
2007-11 -- (現在)日本計量振興協会ISO/TC12国内委員会/委員
2015-01 -- (現在)国際標準化機構専門員会 201(表面化学分析)/議長

(最終更新日: 2021-06-22)